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Ultrafine / Superfine Silicon Nitride Powder (Si3N4)

Ultrafine / Superfine Silicon Nitride Powder (Si3N4)

AvailableUltrafine Silicon Nitride Powder for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: Si3N4
  • Purity: 99% - 99.999%
  • Particle size: 0.01 - 250 um
  • Shape: α-phase / β-phase
  • Min. Order: 1 kg
  • In stock: Available
  • Ships to: Worldwide
  • Ultrafine Silicon Nitride Powder Price & List

    Product Name Purity Shape Spec. N O C Impurity Si-free
    Ultrafine Silicon Nitride Powder ≥99.99% β-phase D50 2.2-3.2 um > 38% < 1% < 0.2% < 20 ppm < 0.5%
    Ultrafine Silicon Nitride Powder ≥99.98% α-phase D50 1.8-3.0 um > 38% < 1% < 0.3% < 150 ppm < 0.5%
    Ultrafine Silicon Nitride Powder ≥99.95% α-phase D50 < 0.8 um > 38% / < 0.3% < 500 ppm /
    Ultrafine Silicon Nitride Powder ≥99.97% α-phase D50 < 3.2 um > 38.5% < 1.2% < 0.3% < 300 ppm < 0.5%
    Ultrafine Silicon Nitride Powder ≥99.60% α-phase D50 < 0.8 um > 38% < 2.5% < 0.3% < 0.4% /
    Ultrafine Silicon Nitride Powder ≥99.65% α-phase D50 < 2.8 um > 38.5% < 1.5% < 0.3% < 0.35% < 0.6%
    Note: We provide customized service. If you don't find the powder you want, please send us an email directly. We can customize it according to your requirements.

    Ultrafine silicon nitride powder refers to a very fine silicon nitride powder with an average particle size of 1-10 um. Compared with nano silicon nitride powder, ultra-fine silicon nitride powder has better economy. For coarse and fine silicon nitride powder, ultra-fine silicon nitride powder has better product performance at the end of the product.

    Ultrafine Silicon Nitride Powder Application

    Ultrafine silicon nitride powder can be used in the following occasions or fields:
    1. Used as silicon nitride coating for demoulding polysilicon ingots;
    2. Used as raw material of fluorescent powder;
    3. For making silicon nitride functional ceramics;
    4. Used to make coatings and parts of key parts of the machine;
    5. Used for making heat conducting materials and heating elements;
    6. Used as sputtering target, medical, semiconductor film and electronic materials.
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