Ultrafine / Superfine Silicon Nitride Powder (Si3N4)
AvailableUltrafine Silicon Nitride Powder for SaleWholesale & RetailManufacturer & SupplierFactory Supply
Symbol: Si3N4Purity: 99% - 99.999%Particle size: 0.01 - 250 umShape: α-phase / β-phaseMin. Order: 1 kgIn stock: AvailableShips to: Worldwide
Ultrafine Silicon Nitride Powder Price & List
Product Name |
Purity |
Shape |
Spec. |
N |
O |
C |
Impurity |
Si-free |
Ultrafine Silicon Nitride Powder |
≥99.99% |
β-phase |
D50 2.2-3.2 um |
> 38% |
< 1% |
< 0.2% |
< 20 ppm |
< 0.5% |
Ultrafine Silicon Nitride Powder |
≥99.98% |
α-phase |
D50 1.8-3.0 um |
> 38% |
< 1% |
< 0.3% |
< 150 ppm |
< 0.5% |
Ultrafine Silicon Nitride Powder |
≥99.95% |
α-phase |
D50 < 0.8 um |
> 38% |
/ |
< 0.3% |
< 500 ppm |
/ |
Ultrafine Silicon Nitride Powder |
≥99.97% |
α-phase |
D50 < 3.2 um |
> 38.5% |
< 1.2% |
< 0.3% |
< 300 ppm |
< 0.5% |
Ultrafine Silicon Nitride Powder |
≥99.60% |
α-phase |
D50 < 0.8 um |
> 38% |
< 2.5% |
< 0.3% |
< 0.4% |
/ |
Ultrafine Silicon Nitride Powder |
≥99.65% |
α-phase |
D50 < 2.8 um |
> 38.5% |
< 1.5% |
< 0.3% |
< 0.35% |
< 0.6% |
Note: We provide customized service. If you don't find the powder you want, please send us an email directly. We can customize it according to your requirements.
Ultrafine silicon nitride powder refers to a very fine silicon nitride powder with an average particle size of 1-10 um. Compared with nano silicon nitride powder, ultra-fine silicon nitride powder has better economy. For coarse and fine silicon nitride powder, ultra-fine silicon nitride powder has better product performance at the end of the product.
Ultrafine Silicon Nitride Powder Application
Ultrafine silicon nitride powder can be used in the following occasions or fields:
1. Used as silicon nitride coating for demoulding polysilicon ingots;
2. Used as raw material of fluorescent powder;
3. For making silicon nitride functional ceramics;
4. Used to make coatings and parts of key parts of the machine;
5. Used for making heat conducting materials and heating elements;
6. Used as
sputtering target, medical, semiconductor film and electronic materials.