Aluminium Zirconium Silicon Alloy Sputtering Target (Al-Zr-Si)

Aluminium Zirconium Silicon Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Aluminium Zirconium Silicon Alloy Sputtering Target	Circular	99.5%	0 - 48	≥ 1
Aluminium Zirconium Silicon Alloy Sputtering Target	Rectangular	99.5%	0 - 48	≥ 1
Aluminium Zirconium Silicon Alloy Sputtering Target	Annular	99.5%	0 - 48	≥ 1
Aluminium Zirconium Silicon Alloy Sputtering Target	Oval	99.5%	0 - 48	≥ 1
Aluminium Zirconium Silicon Alloy Sputtering Target	Cylindrical	99.5%	0 - 48	≥ 1
Aluminium Zirconium Silicon Alloy Sputtering Target	Planar	99.5%	0 - 48	≥ 1
Aluminium Zirconium Silicon Alloy Sputtering Target	Rotatable (rotary)	99.5%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Aluminium zirconium silicon alloy sputtering target is a ternary alloy sputtering target made of high-purity aluminum powder, zirconium powder, and silicon powder in a certain proportion. After the aluminium zirconium silicon alloy sputtering target is made into an aluminium zirconium silicon blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, aluminium zirconium silicon alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. aluminium zirconium silicon alloy targets. We can customize aluminium zirconium silicon alloy sputtering targets with different shapes and chemical composition.

Aluminium Zirconium Silicon Alloy Sputtering Target Application

Aluminium zirconium silicon alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing aluminium zirconium silicon alloy films.