Aluminum Nitride Sputtering Target

Aluminum Nitride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Aluminum Nitride Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Aluminum Nitride Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Aluminum Nitride Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Aluminum Nitride Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Aluminum Nitride Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Aluminum Nitride Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Aluminum Nitride Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Aluminum nitride is a kind of nitride with white or gray in appearance. The chemical formula is AlN. Aluminum nitride is an atomic crystal, which belongs to diamond-like nitride, hexagonal system, non-toxic.

Aluminum nitride sputtering target is a kind of high purity aluminum nitride raw material by sputtering deposition. According to the different shapes, aluminum nitride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) aluminum nitride targets. Aluminum nitride can be used in optoelectronic engineering, including optical storage interface and electronic substrate as electric inducer, wafer carrier with high thermal conductivity, and military applications. Aluminum nitride can also be used as heat exchanger material for high temperature structural parts, crucible and casting die material for melting Al, Cu, Ag, Pb and other metals.

Aluminum Nitride Sputtering Target Application

Aluminum nitride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.