Aluminum Oxide (Alumina) Sputtering Target

Aluminum Oxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Aluminum Oxide Sputtering Target	Circular	99.99%	0 - 48	≥ 1
Aluminum Oxide Sputtering Target	Rectangular	99.99%	0 - 48	≥ 1
Aluminum Oxide Sputtering Target	Annular	99.99%	0 - 48	≥ 1
Aluminum Oxide Sputtering Target	Oval	99.99%	0 - 48	≥ 1
Aluminum Oxide Sputtering Target	Cylindrical	99.99%	0 - 48	≥ 1
Aluminum Oxide Sputtering Target	Planar	99.99%	0 - 48	≥ 1
Aluminum Oxide Sputtering Target	Rotatable (rotary)	99.99%	0 - 48	≥ 1

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Alumina is a high hardness compound. The chemical formula is Al2O3. It is an ionic crystal with a melting point of 2054 ℃ and a boiling point of 2980 ℃. Alumina is a kind of white solid which is difficult to dissolve in water. It is odorless, tasteless, hard and easy to absorb moisture without deliquescence. Alumina can be used as analytical reagent, dehydration of organic solvent, adsorbent, organic reaction catalyst, grinding agent, polishing agent, raw material for smelting aluminum and refractory material.

Alumina sputtering target is a kind of high purity alumina raw material by sputtering deposition. According to the different shapes, aluminum oxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) alumina targets. It is mainly used in LED artificial sapphire crystal, advanced ceramics, PDP phosphor and some high performance materials. In addition, aluminum oxide sputtering targets can also be used in high pressure sodium lamps, new luminescent materials, special ceramics, advanced coatings, tricolor, catalysts and some high performance materials.

Aluminum Oxide Sputtering Target Application

Alumina can be used for pretreatment before electroplating, painting, glazing and coating of polytetrafluoroethylene; deburring and descaling of aluminum and alloy products; mold cleaning; pretreatment of metal sandblasting; dry and wet grinding; precision optical refraction; grinding of minerals, metals, glass and crystals; glass engraving and paint additives. In sputtering coating, aluminum oxide sputtering target can be used in microelectronics, display, storage and other fields. The details are as follows:
- Aerospace;
- Automobile;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.