AZO Sputtering Target (ZnO/Al2O3, 98/2 wt%)

AZO Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
AZO Sputtering Target	Circular	99.99%	0 - 48	≥ 1
AZO Sputtering Target	Rectangular	99.99%	0 - 48	≥ 1
AZO Sputtering Target	Annular	99.99%	0 - 48	≥ 1
AZO Sputtering Target	Oval	99.99%	0 - 48	≥ 1
AZO Sputtering Target	Cylindrical	99.99%	0 - 48	≥ 1
AZO Sputtering Target	Planar	99.99%	0 - 48	≥ 1
AZO Sputtering Target	Rotatable (rotary)	99.99%	0 - 48	≥ 1

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Alumina-doped zinc oxide (AZO, ZnO / Al2O3, 98/2 wt%) is a oxide of ZnO and Al2O3 in varying proportions. AZO films can be deposited by RF or DC magnetron sputtering, but not by thermal evaporation. If the sputter target is non-conducting, as with a ceramic composition, RF sputter techniques are necessary; otherwise reactive DC magnetron sputtering is preferred.

AZO sputtering target is a kind of alumina-doped zinc oxide raw material by sputtering deposition. According to the different shapes, AZO sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) AZO targets. AZO sputtering target is used for thin film deposition, typically for fuel cell, decoration, semiconductor, display, LED and photovoltaic devices, glass coating, etc. 

AZO Sputtering Target Application

High purity AZO sputtering target can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The details are as follows:
- Low-E Glass Industry (Architectural glass, Automotive glass);
- Thin Film Photovoltaic Industry (TCO);
- Flat Panel Displays.