Barium Sputtering Target

Barium Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Barium Sputtering Target	Circular (Disc)	99.5% - 99.9%	0 - 48	≥ 1
Barium Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Barium Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Barium Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Barium Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Barium Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Barium Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Barium is a kind of metal with silver white metallic luster. The chemical element symbol is Ba. The melting point is 725 ° C, the boiling point is 1600 ° C, and the density is 3.5 g/cm3. Barium has ductility. 

Barium sputtering target is a kind of high purity barium raw material by sputtering deposition. According to the different shapes, barium sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) barium targets. Barium can be used to make barium salts, alloys, fireworks, nuclear reactors, etc. it is also an excellent deoxidizer for copper refining. Barium can be widely used in alloys, such as lead, calcium, magnesium, sodium, lithium, aluminum and nickel.

Barium Sputtering Target Application

High purity barium sputtering target can be used in many applications. The details are as follows:
- Electronics;
- Semiconductor;
- Flat panel displays.