Bismuth Antimony Telluride Sputtering Target

Bismuth Antimony Telluride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Bismuth Antimony Telluride Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
Bismuth Antimony Telluride Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
Bismuth Antimony Telluride Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
Bismuth Antimony Telluride Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
Bismuth Antimony Telluride Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
Bismuth Antimony Telluride Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
Bismuth Antimony Telluride Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

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Bismuth antimony telluride sputtering target is a kind of high purity bismuth antimony telluride raw material by sputtering deposition. According to the different shapes, bismuth antimony telluride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) bismuth antimony telluride targets. 

Bismuth Antimony Telluride Sputtering Target Application

Bismuth antimony telluride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.