Bismuth Selenide Sputtering Target

Bismuth Selenide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Bismuth Selenide Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
Bismuth Selenide Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
Bismuth Selenide Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
Bismuth Selenide Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
Bismuth Selenide Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
Bismuth Selenide Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
Bismuth Selenide Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

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Bismuth selenide is a kind of selenide with rhombohedral crystal structure. The chemical formula is Bi2Se3. The density is 6.82 g / cm3. The melting point is 710 ℃. Bismuth selenide is insoluble in alkali and easily decomposed by concentrated acid and aqua regia. Bismuth selenide is prepared by the direct reaction of selenium and bismuth or the reaction of bismuth oxide and hydrogen selenide.

Bismuth selenide sputtering target is a kind of high purity bismuth selenide raw material by sputtering deposition. According to the different shapes, bismuth selenide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) bismuth selenide targets. Bismuth selenide can be used as semiconductor material and thermoelectric material.

Bismuth Selenide Sputtering Target Application

High purity bismuth selenide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.