Bismuth Telluride Sputtering Target

Bismuth Telluride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Bismuth Telluride Sputtering Target	Circular	99.999%	0 - 48	≥ 1
Bismuth Telluride Sputtering Target	Rectangular	99.999%	0 - 48	≥ 1
Bismuth Telluride Sputtering Target	Annular	99.999%	0 - 48	≥ 1
Bismuth Telluride Sputtering Target	Oval	99.999%	0 - 48	≥ 1
Bismuth Telluride Sputtering Target	Cylindrical	99.999%	0 - 48	≥ 1
Bismuth Telluride Sputtering Target	Planar	99.999%	0 - 48	≥ 1
Bismuth Telluride Sputtering Target	Rotatable (rotary)	99.999%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Bismuth telluride is a kind of telluride with gray appearance. The molecular formula is Bi2Te3. The density is 7.8587g/cm3. The melting point is 585 ℃. The lattice constant is 1.0473nm. Bismuth telluride is an indirect band gap semiconductor with a band gap of 0.145 EV at room temperature, electron and hole mobility of 0.135 and 4.4 × 10-2 m2 / (V · s) respectively, and a thermoelectric quality coefficient of 1.6 × 10-3 / K.

Bismuth telluride sputtering target is a kind of high purity bismuth telluride raw material by sputtering deposition. According to the different shapes, bismuth telluride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) bismuth telluride targets. Bismuth telluride is a semiconductor material with good conductivity but poor thermal conductivity. Bismuth telluride is a good temperature difference material.

Bismuth Telluride Sputtering Target Application

Bismuth telluride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.