Cerium Cobalt Alloy Sputtering Target (Ce-Co)

Cerium Cobalt Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Cerium Cobalt Alloy Sputtering Target	Circular	99.5%	0 - 48	≥ 1
Cerium Cobalt Alloy Sputtering Target	Rectangular	99.5%	0 - 48	≥ 1
Cerium Cobalt Alloy Sputtering Target	Annular	99.5%	0 - 48	≥ 1
Cerium Cobalt Alloy Sputtering Target	Oval	99.5%	0 - 48	≥ 1
Cerium Cobalt Alloy Sputtering Target	Cylindrical	99.5%	0 - 48	≥ 1
Cerium Cobalt Alloy Sputtering Target	Planar	99.5%	0 - 48	≥ 1
Cerium Cobalt Alloy Sputtering Target	Rotatable (rotary)	99.5%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Cerium cobalt alloy sputtering target is a kind of binary alloy sputtering target made of high-purity cerium powder and cobalt powder in a certain proportion. After the cerium cobalt alloy sputtering target is made into a cerium cobalt alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, cerium cobalt alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. cerium cobalt alloy targets. We can customize cerium cobalt alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Cerium Cobalt Alloy Sputtering Target Application

Cerium cobalt alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing cerium cobalt alloy films.