Cerium Sputtering Target

Cerium Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Cerium Sputtering Target	Circular	99.9% - 99.99%	0 - 48	≥ 1
Cerium Sputtering Target	Rectangular	99.9% - 99.99%	0 - 48	≥ 1
Cerium Sputtering Target	Annular	99.9% - 99.99%	0 - 48	≥ 1
Cerium Sputtering Target	Oval	99.9% - 99.99%	0 - 48	≥ 1
Cerium Sputtering Target	Cylindrical	99.9% - 99.99%	0 - 48	≥ 1
Cerium Sputtering Target	Planar	99.9% - 99.99%	0 - 48	≥ 1
Cerium Sputtering Target	Rotatable (rotary)	99.9% - 99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Cerium is a silver gray active metal. The element symbol is Ce. The density is 6.9g/cm3 (square crystal), 6.7g/cm3 (hexagonal crystal). The melting point is 799 ℃. The boiling point is 3426 ℃. Cerium powder is easy to spontaneous combustion in air and soluble in acid. It is a reducing agent.

Cerium sputtering target is a kind of high purity cerium raw material by sputtering deposition. According to the different shapes, cerium sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) cerium targets. Cerium can be used to make flint, ceramics, alloy, reducing agent and catalyst. Cerium can also be used as alloy additive, arc electrode and special glass. Cerium alloy is resistant to high heat and can be used to make jet propulsion parts.

Cerium Sputtering Target Application

High purity cerium sputtering target can be used in many applications. The details are as follows:
- Electronics;
- Semiconductor;
- Flat panel displays.