Chromium Molybdenum Alloy Sputtering Target (Cr-Mo)

Chromium Molybdenum Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Chromium Molybdenum Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
Chromium Molybdenum Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
Chromium Molybdenum Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
Chromium Molybdenum Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
Chromium Molybdenum Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
Chromium Molybdenum Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
Chromium Molybdenum Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Chromium molybdenum alloy sputtering target is a kind of binary alloy sputtering target made of high-purity chromium powder and molybdenum powder in a certain proportion. After the chromium molybdenum alloy sputtering target is made into a chromium molybdenum alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, chromium molybdenum alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. chromium molybdenum alloy targets. We can customize chromium molybdenum alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Chromium Molybdenum Alloy Sputtering Target Application

Chromium molybdenum alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing chromium molybdenum alloy films.