Cobalt Iron Boron Alloy Sputtering Target (Co-Fe-B)

Cobalt Iron Boron Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Cobalt Iron Boron Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
Cobalt Iron Boron Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
Cobalt Iron Boron Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
Cobalt Iron Boron Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
Cobalt Iron Boron Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
Cobalt Iron Boron Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
Cobalt Iron Boron Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Cobalt iron boron alloy sputtering target is a kind of ternary alloy sputtering target made of high-purity cobalt powder, iron powder, and boron powder in a certain proportion. After the cobalt iron boron alloy sputtering target is made into a cobalt iron boron alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, cobalt iron boron alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. cobalt iron boron alloy targets. We can customize cobalt iron boron alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Cobalt Iron Boron Alloy Sputtering Target Application

Cobalt iron boron alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing cobalt iron boron alloy films.