Copper Oxide Sputtering Target

Copper Oxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Copper Oxide Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Copper Oxide Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Copper Oxide Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Copper Oxide Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Copper Oxide Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Copper Oxide Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Copper Oxide Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Copper oxide is a kind of amorphous powder with black or brown black in appearance. The chemical formula is CuO. The density is 6.3-6.49 g / cm3, and the melting point is 1326 ° C. It is insoluble in water and alcohol, but soluble in dilute acid, ammonium chloride, ammonium carbonate and potassium cyanide.

Copper oxide sputtering target is a kind of copper oxide raw material by sputtering deposition. According to the different shapes, copper oxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) copper oxide targets. Copper oxide is mainly used for making rayon, ceramics, glaze and enamel, battery, petroleum desulfurizer, insecticide, hydrogen production, catalyst, green glass, etc.

Copper Oxide Sputtering Target Application

High purity copper oxide sputtering target can be used in many applications. The details are as follows:
- Ferroelectric;
- Gate dielectric;
- For CMOS.