Copper Titanium Alloy Sputtering Target (Cu-Ti)

Copper Titanium Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Copper Titanium Alloy Sputtering Target	Circular	99.5%	0 - 48	≥ 1
Copper Titanium Alloy Sputtering Target	Rectangular	99.5%	0 - 48	≥ 1
Copper Titanium Alloy Sputtering Target	Annular	99.5%	0 - 48	≥ 1
Copper Titanium Alloy Sputtering Target	Oval	99.5%	0 - 48	≥ 1
Copper Titanium Alloy Sputtering Target	Cylindrical	99.5%	0 - 48	≥ 1
Copper Titanium Alloy Sputtering Target	Planar	99.5%	0 - 48	≥ 1
Copper Titanium Alloy Sputtering Target	Rotatable (rotary)	99.5%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Copper titanium alloy sputtering target is a kind of binary alloy sputtering target made of high-purity copper powder and titanium powder in a certain proportion. After the copper titanium alloy sputtering target is made into a copper titanium alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, copper titanium alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. copper titanium alloy targets. We can customize copper titanium alloy sputtering targets with different shapes according to customers' requirements, or we can customize targets with different copper titanium alloy compositions according to customers' chemical composition requirements.

Copper Titanium Alloy Sputtering Target Application

Copper titanium alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing copper titanium alloy films.