Cuprous Telluride Sputtering Target

Cuprous Telluride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Cuprous Telluride Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
Cuprous Telluride Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
Cuprous Telluride Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
Cuprous Telluride Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
Cuprous Telluride Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
Cuprous Telluride Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
Cuprous Telluride Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

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Cuprous telluride is an octahedral crystal with blue black appearance. The molecular formula is Cu2Te. The relative density is 7.27. The melting point is 900 ℃. Cuprous telluride is insoluble in hydrochloric acid and sulfuric acid, but soluble in bromine water. It is obtained by melting electrolytic copper and pure tellurium in the crucible with protective layers of sodium chloride and potassium chloride.

Cuprous telluride sputtering target is a kind of high purity cuprous telluride raw material by sputtering deposition. According to the different shapes, cuprous telluride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) cuprous telluride targets. Cuprous telluride can be used as raw material for industrial preparation of elemental tellurium.

Cuprous Telluride Sputtering Target Application

Cuprous telluride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.