Germanium Antimony Telluride Sputtering Target

Germanium Antimony Telluride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Germanium Antimony Telluride Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
Germanium Antimony Telluride Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
Germanium Antimony Telluride Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
Germanium Antimony Telluride Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
Germanium Antimony Telluride Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
Germanium Antimony Telluride Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
Germanium Antimony Telluride Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

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Germanium antimony telluride is a ternary compound of germanium, antimony, and tellurium, with the composition GeTe-Sb2Te3. It is not stable because of its low activation energy. Germanium antimony telluride is generally P-type, and there are many electronic states in the band-gap accounting for acceptor and donor like traps. Germanium antimony telluride has two stable states, crystalline and amorphous.

Germanium antimony telluride sputtering target is a kind of high purity germanium antimony telluride raw material by sputtering deposition. According to the different shapes, germanium antimony telluride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) germanium antimony telluride targets. 

Germanium Antimony Telluride Sputtering Target Application

Germanium antimony telluride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.