Germanium Silicon Alloy Sputtering Target (Ge-Si)

Germanium Silicon Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Germanium Silicon Alloy Sputtering Target	Circular	99.999%	0 - 48	≥ 1
Germanium Silicon Alloy Sputtering Target	Rectangular	99.999%	0 - 48	≥ 1
Germanium Silicon Alloy Sputtering Target	Annular	99.999%	0 - 48	≥ 1
Germanium Silicon Alloy Sputtering Target	Oval	99.999%	0 - 48	≥ 1
Germanium Silicon Alloy Sputtering Target	Cylindrical	99.999%	0 - 48	≥ 1
Germanium Silicon Alloy Sputtering Target	Planar	99.999%	0 - 48	≥ 1
Germanium Silicon Alloy Sputtering Target	Rotatable (rotary)	99.999%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Germanium silicon alloy sputtering target is a kind of binary alloy sputtering target made of high-purity germanium powder and silicon powder in a certain proportion. After the germanium silicon alloy sputtering target is made into a germanium silicon alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, germanium silicon alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. germanium silicon alloy targets. We can customize germanium silicon alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Germanium Silicon Alloy Sputtering Target Application

Germanium silicon alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing germanium silicon alloy films.