Hafnium Diboride Sputtering Target

Hafnium Diboride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Hafnium Diboride Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Diboride Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Diboride Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Diboride Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Diboride Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Diboride Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Hafnium Diboride Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Hafnium diboride is a type of ceramic composed of hafnium and boron which belongs to the class of ultra-high-temperature ceramics. The melting point is about 3250 °C. It has relatively high thermal and electrical conductivities. It is a grey, metallic looking material. Hafnium diboride has a hexagonal crystal structure, a molar mass of 200.11 grams per mole, and a density of ~10.5 g/cm³.

Hafnium diboride sputtering target is a kind of high purity hafnium diboride raw material by sputtering deposition. According to the different shapes, hafnium diboride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) hafnium diboride targets. Hafnium diboride can be used in hypervelocity reentry vehicles such as ICBM heat shields or aerodynamic leading-edges. Hafnium diboride is also used as a possible new material for nuclear reactor control rods.

Hafnium Diboride Sputtering Target Application

High purity hafnium diboride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.