Hafnium Telluride Sputtering Target

Hafnium Telluride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Hafnium Telluride Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
Hafnium Telluride Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
Hafnium Telluride Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
Hafnium Telluride Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
Hafnium Telluride Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
Hafnium Telluride Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
Hafnium Telluride Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

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Hafnium telluride is a chemical compound of hafnium and tellurium. The molecular formula is HfTe2. The molecular weight is 433.69.

Hafnium telluride sputtering target is a kind of high purity hafnium telluride raw material by sputtering deposition. According to the different shapes, hafnium telluride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) hafnium telluride targets. 

Hafnium Telluride Sputtering Target Application

Hafnium telluride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.