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High Purity Chromium Oxide Sputtering Target

High Purity Chromium Oxide Sputtering Target

AvailableHigh Purity Chromium Oxide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: Cr2O3
  • Purity: 99.9% - 99.99%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • High Purity Chromium Oxide Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    High Purity Chromium Oxide Sputtering Target Circular 99.9% - 99.99% 0 - 48 ≥ 1
    High Purity Chromium Oxide Sputtering Target Rectangular 99.9% - 99.99% 0 - 48 ≥ 1
    High Purity Chromium Oxide Sputtering Target Annular 99.9% - 99.99% 0 - 48 ≥ 1
    High Purity Chromium Oxide Sputtering Target Oval 99.9% - 99.99% 0 - 48 ≥ 1
    High Purity Chromium Oxide Sputtering Target Cylindrical 99.9% - 99.99% 0 - 48 ≥ 1
    High Purity Chromium Oxide Sputtering Target Planar 99.9% - 99.99% 0 - 48 ≥ 1
    High Purity Chromium Oxide Sputtering Target Rotatable (rotary) 99.9% - 99.99% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    High purity chromium oxide sputtering target refers to the high purity chromium oxide sputtering target with purity over 99%. We mainly provide 3N (99.9%) high-purity chromium oxide sputtering targets.

    High Purity Chromium Oxide Sputtering Target Application

    High purity chromium oxide sputtering target can be used in many applications. The details are as follows:
    - Ferroelectric;
    - Gate Dielectric;
    - For CMOS;
    - Non-volatile Memory;
    - Thin film capacitor;
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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