High Purity Chromium Oxide Sputtering Target
AvailableHigh Purity Chromium Oxide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
Symbol: Cr2O3Purity: 99.9% - 99.99%Size: 0 - 48 inchThickness: ≥ 1 mmShape: Circular, rectangular, annular, rotary etc.Ships to: Worldwide
High Purity Chromium Oxide Sputtering Target List
Product Name |
Shape |
Purity |
Size (inch) |
Thickness (mm) |
High Purity Chromium Oxide Sputtering Target |
Circular |
99.9% - 99.99% |
0 - 48 |
≥ 1 |
High Purity Chromium Oxide Sputtering Target |
Rectangular |
99.9% - 99.99% |
0 - 48 |
≥ 1 |
High Purity Chromium Oxide Sputtering Target |
Annular |
99.9% - 99.99% |
0 - 48 |
≥ 1 |
High Purity Chromium Oxide Sputtering Target |
Oval |
99.9% - 99.99% |
0 - 48 |
≥ 1 |
High Purity Chromium Oxide Sputtering Target |
Cylindrical |
99.9% - 99.99% |
0 - 48 |
≥ 1 |
High Purity Chromium Oxide Sputtering Target |
Planar |
99.9% - 99.99% |
0 - 48 |
≥ 1 |
High Purity Chromium Oxide Sputtering Target |
Rotatable (rotary) |
99.9% - 99.99% |
0 - 48 |
≥ 1 |
Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.
High purity chromium oxide sputtering target refers to the high purity chromium oxide sputtering target with purity over 99%. We mainly provide 3N (99.9%) high-purity chromium oxide sputtering targets.
High Purity Chromium Oxide Sputtering Target Application
High purity chromium oxide sputtering target can be used in many applications. The details are as follows:
- Ferroelectric;
- Gate Dielectric;
- For CMOS;
- Non-volatile Memory;
- Thin film capacitor;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.