High Purity Copper Selenide Sputtering Target

High Purity Copper Selenide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Copper Selenide Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
High Purity Copper Selenide Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
High Purity Copper Selenide Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
High Purity Copper Selenide Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
High Purity Copper Selenide Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
High Purity Copper Selenide Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
High Purity Copper Selenide Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity copper selenide sputtering target refers to the high purity copper selenide sputtering target with purity over 99%. We mainly provide 4N (99.99%) and 5N (99.999%) high-purity copper selenide sputtering targets.

High Purity Copper Selenide Sputtering Target Application

High purity copper selenide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.