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High Purity Indium Oxide Sputtering Target

High Purity Indium Oxide Sputtering Target

AvailableHigh Purity Indium Oxide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: In2O3
  • Purity: 99.99% - 99.999%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • High Purity Indium Oxide Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    High Purity Indium Oxide Sputtering Target Circular 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Indium Oxide Sputtering Target Rectangular 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Indium Oxide Sputtering Target Annular 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Indium Oxide Sputtering Target Oval 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Indium Oxide Sputtering Target Cylindrical 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Indium Oxide Sputtering Target Planar 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Indium Oxide Sputtering Target Rotatable (rotary) 99.99% - 99.999% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    High purity indium oxide sputtering target refers to the high purity indium oxide sputtering target with purity over 99%. We mainly provide 4N (99.99%) high-purity indium oxide sputtering target.

    High Purity Indium Oxide Sputtering Target Application

    High purity indium oxide sputtering target can be used in many applications. The details are as follows:
    - Transparent conductive flim
    - As protective coating of metal mirror
    - Glass and electronic components
    - Battery
    - ITO powder
    - Flat Panel Displays
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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