High Purity Indium Oxide Sputtering Target
AvailableHigh Purity Indium Oxide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
Symbol: In2O3Purity: 99.99% - 99.999%Size: 0 - 48 inchThickness: ≥ 1 mmShape: Circular, rectangular, annular, rotary etc.Ships to: Worldwide
High Purity Indium Oxide Sputtering Target List
Product Name |
Shape |
Purity |
Size (inch) |
Thickness (mm) |
High Purity Indium Oxide Sputtering Target |
Circular |
99.99% - 99.999% |
0 - 48 |
≥ 1 |
High Purity Indium Oxide Sputtering Target |
Rectangular |
99.99% - 99.999% |
0 - 48 |
≥ 1 |
High Purity Indium Oxide Sputtering Target |
Annular |
99.99% - 99.999% |
0 - 48 |
≥ 1 |
High Purity Indium Oxide Sputtering Target |
Oval |
99.99% - 99.999% |
0 - 48 |
≥ 1 |
High Purity Indium Oxide Sputtering Target |
Cylindrical |
99.99% - 99.999% |
0 - 48 |
≥ 1 |
High Purity Indium Oxide Sputtering Target |
Planar |
99.99% - 99.999% |
0 - 48 |
≥ 1 |
High Purity Indium Oxide Sputtering Target |
Rotatable (rotary) |
99.99% - 99.999% |
0 - 48 |
≥ 1 |
Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.
High purity indium oxide sputtering target refers to the high purity indium oxide sputtering target with purity over 99%. We mainly provide 4N (99.99%) high-purity indium oxide sputtering target.
High Purity Indium Oxide Sputtering Target Application
High purity indium oxide sputtering target can be used in many applications. The details are as follows:
- Transparent conductive flim
- As protective coating of metal mirror
- Glass and electronic components
- Battery
- ITO powder
- Flat Panel Displays
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.