High Purity Iron Boride Sputtering Target

High Purity Iron Boride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Iron Boride Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
High Purity Iron Boride Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
High Purity Iron Boride Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
High Purity Iron Boride Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
High Purity Iron Boride Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
High Purity Iron Boride Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
High Purity Iron Boride Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity iron boride sputtering target refers to the high purity iron boride sputtering target with purity over 99%. We mainly provide 2N5 (99.5%) high-purity iron boride sputtering target.

High Purity Iron Boride Sputtering Target Application

High purity iron boride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.