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High Purity Magnesium Fluoride Sputtering Target

High Purity Magnesium Fluoride Sputtering Target

AvailableHigh Purity Magnesium Fluoride Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: MgF2
  • Purity: 99.99% - 99.999%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • High Purity Magnesium Fluoride Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    High Purity Magnesium Fluoride Sputtering Target Circular 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Magnesium Fluoride Sputtering Target Rectangular 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Magnesium Fluoride Sputtering Target Annular 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Magnesium Fluoride Sputtering Target Oval 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Magnesium Fluoride Sputtering Target Cylindrical 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Magnesium Fluoride Sputtering Target Planar 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Magnesium Fluoride Sputtering Target Rotatable (rotary) 99.99% - 99.999% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    High purity magnesium fluoride sputtering target refers to the high purity magnesium fluoride sputtering target with purity over 99%. We mainly provide 4N (99.99%) high-purity magnesium fluoride sputtering target.

    High Purity Magnesium Fluoride Sputtering Target Application

    High purity magnesium fluoride sputtering target can be used in many applications. The details are as follows:
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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