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High Purity Molybdenum Carbide Sputtering Target

High Purity Molybdenum Carbide Sputtering Target

AvailableHigh Purity Molybdenum Carbide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: Mo2C
  • Purity: 99.5% - 99.9%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • High Purity Molybdenum Carbide Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    High Purity Molybdenum Carbide Sputtering Target Circular 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Molybdenum Carbide Sputtering Target Rectangular 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Molybdenum Carbide Sputtering Target Annular 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Molybdenum Carbide Sputtering Target Oval 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Molybdenum Carbide Sputtering Target Cylindrical 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Molybdenum Carbide Sputtering Target Planar 99.5% - 99.9% 0 - 48 ≥ 1
    High Purity Molybdenum Carbide Sputtering Target Rotatable (rotary) 99.5% - 99.9% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    High purity molybdenum carbide sputtering target refers to the high purity molybdenum carbide sputtering target with purity over 99%. We mainly provide 2N5 (99.5%) high-purity molybdenum carbide sputtering targets.

    High Purity Molybdenum Carbide Sputtering Target Application

    High purity molybdenum carbide sputtering target can be used in many applications. The details are as follows:
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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