High Purity Tin Oxide Sputtering Target
AvailableHigh Purity Tin Oxide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
Symbol: SnO2Purity: 99.99% - 99.999%Size: 0 - 48 inchThickness: ≥ 1 mmShape: Circular, rectangular, annular, rotary etc.Ships to: Worldwide
High Purity Tin Oxide Sputtering Target List
Product Name |
Shape |
Purity |
Size (inch) |
Thickness (mm) |
High Purity Tin Oxide Sputtering Target |
Circular |
99.99% - 99.999% |
0 - 48 |
≥ 1 |
High Purity Tin Oxide Sputtering Target |
Rectangular |
99.99% - 99.999% |
0 - 48 |
≥ 1 |
High Purity Tin Oxide Sputtering Target |
Annular |
99.99% - 99.999% |
0 - 48 |
≥ 1 |
High Purity Tin Oxide Sputtering Target |
Oval |
99.99% - 99.999% |
0 - 48 |
≥ 1 |
High Purity Tin Oxide Sputtering Target |
Cylindrical |
99.99% - 99.999% |
0 - 48 |
≥ 1 |
High Purity Tin Oxide Sputtering Target |
Planar |
99.99% - 99.999% |
0 - 48 |
≥ 1 |
High Purity Tin Oxide Sputtering Target |
Rotatable (rotary) |
99.99% - 99.999% |
0 - 48 |
≥ 1 |
Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.
High purity tin oxide sputtering target refers to the high purity tin oxide sputtering target with purity over 99%. We mainly provide 4N (99.99%) high-purity tin oxide sputtering targets.
High Purity Tin Oxide Sputtering Target Application
High purity tin oxide sputtering target can be used in many applications. The details are as follows:
- Normal temperature low resistance;
- High conductivity;
- High Density electrode materials;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.