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High Purity Tin Oxide Sputtering Target

High Purity Tin Oxide Sputtering Target

AvailableHigh Purity Tin Oxide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: SnO2
  • Purity: 99.99% - 99.999%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • High Purity Tin Oxide Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    High Purity Tin Oxide Sputtering Target Circular 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Tin Oxide Sputtering Target Rectangular 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Tin Oxide Sputtering Target Annular 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Tin Oxide Sputtering Target Oval 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Tin Oxide Sputtering Target Cylindrical 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Tin Oxide Sputtering Target Planar 99.99% - 99.999% 0 - 48 ≥ 1
    High Purity Tin Oxide Sputtering Target Rotatable (rotary) 99.99% - 99.999% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    High purity tin oxide sputtering target refers to the high purity tin oxide sputtering target with purity over 99%. We mainly provide 4N (99.99%) high-purity tin oxide sputtering targets.

    High Purity Tin Oxide Sputtering Target Application

    High purity tin oxide sputtering target can be used in many applications. The details are as follows:
    - Normal temperature low resistance;
    - High conductivity;
    - High Density electrode materials;
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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