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High Purity Titanium Dioxide Sputtering Target

High Purity Titanium Dioxide Sputtering Target

AvailableHigh Purity Titanium Dioxide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: TiO2
  • Purity: 99.95% - 99.99%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • High Purity Titanium Dioxide Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    High Purity Titanium Dioxide Sputtering Target Circular 99.95% - 99.99% 0 - 48 ≥ 1
    High Purity Titanium Dioxide Sputtering Target Rectangular 99.95% - 99.99% 0 - 48 ≥ 1
    High Purity Titanium Dioxide Sputtering Target Annular 99.95% - 99.99% 0 - 48 ≥ 1
    High Purity Titanium Dioxide Sputtering Target Oval 99.95% - 99.99% 0 - 48 ≥ 1
    High Purity Titanium Dioxide Sputtering Target Cylindrical 99.95% - 99.99% 0 - 48 ≥ 1
    High Purity Titanium Dioxide Sputtering Target Planar 99.95% - 99.99% 0 - 48 ≥ 1
    High Purity Titanium Dioxide Sputtering Target Rotatable (rotary) 99.95% - 99.99% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    High purity titanium dioxide sputtering target refers to the high purity titanium dioxide sputtering target with purity over 99%. We mainly provide 3N5 (99.95%) high-purity titanium oxide sputtering targets.

    High Purity Titanium Dioxide Sputtering Target Application

    High purity titanium dioxide sputtering target can be used in many applications. The details are as follows:
    - Decorative coating
    - Flat panel displays
    - Low-E glass industry
    - Semiconductor;
    - Chemical vapor deposition (CVD) display;
    - Physical vapor deposition (PVD) display;
    - Optical applications.
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