High Purity Vanadium Pentoxide Sputtering Target

High Purity Vanadium Pentoxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
High Purity Vanadium Pentoxide Sputtering Target	Circular	99.9% - 99.99%	0 - 48	≥ 1
High Purity Vanadium Pentoxide Sputtering Target	Rectangular	99.9% - 99.99%	0 - 48	≥ 1
High Purity Vanadium Pentoxide Sputtering Target	Annular	99.9% - 99.99%	0 - 48	≥ 1
High Purity Vanadium Pentoxide Sputtering Target	Oval	99.9% - 99.99%	0 - 48	≥ 1
High Purity Vanadium Pentoxide Sputtering Target	Cylindrical	99.9% - 99.99%	0 - 48	≥ 1
High Purity Vanadium Pentoxide Sputtering Target	Planar	99.9% - 99.99%	0 - 48	≥ 1
High Purity Vanadium Pentoxide Sputtering Target	Rotatable (rotary)	99.9% - 99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

High purity vanadium pentoxide sputtering target refers to the high purity vanadium pentoxide sputtering target with purity over 99%.  We mainly provide 3N (99.9%) high-purity vanadium oxide sputtering targets.

High Purity Vanadium Pentoxide Sputtering Target Application

High purity vanadium pentoxide sputtering target can be used in many applications. The details are as follows:
- Ferroelectric;
- Gate Dielectric;
- For CMOS;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.