Indium Sputtering Target

Indium Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Indium Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
Indium Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
Indium Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
Indium Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
Indium Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
Indium Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
Indium Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Indium is a silvery white and bluish metal. The element symbol is In. The melting point is 157 ℃. The boiling point is 2060 ℃. The relative density is 7.30. Indium is malleable and can be pressed into sheets. Indium is mainly used as raw material for manufacturing low melting alloy, bearing alloy, semiconductor, electric light source, etc.

Indium sputtering target is a kind of high purity indium raw material by sputtering deposition. According to the different shapes, indium sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) indium targets. Indium has strong light permeability and conductivity, and is mainly used in the production of ITO targets (for LCD and flat screen). It is widely used in electronic semiconductor, solder and alloy, scientific research, medicine and other fields.

Indium Sputtering Target Application

High purity indium sputtering target produced by FUSHEL has the highest possible density and smallest possible average grain sizes. It can be used in many applications. The details are as follows:
- Electronics;
- Semiconductor;
- Flat panel displays.