Iron Manganese Alloy Sputtering Target (Fe-Mn)

Iron Manganese Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Iron Manganese Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
Iron Manganese Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
Iron Manganese Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
Iron Manganese Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
Iron Manganese Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
Iron Manganese Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
Iron Manganese Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Iron manganese alloy sputtering target is a kind of binary alloy sputtering target made of high-purity iron powder and manganese powder in a certain proportion. After the iron manganese alloy sputtering target is made into a iron manganese alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, iron manganese alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. iron manganese alloy targets. We can customize iron manganese alloy sputtering targets with different shapes according to customers' requirements, or we can customize targets with different iron manganese alloy compositions according to customers' chemical composition requirements.

Iron Manganese Alloy Sputtering Target Application

Iron manganese alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing iron manganese alloy films.