LaNi5 Alloy Sputtering Target

LaNi5 Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
LaNi5 Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
LaNi5 Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
LaNi5 Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
LaNi5 Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
LaNi5 Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
LaNi5 Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
LaNi5 Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

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LaNi5 is an intermetallic compound of hexagonal crystal system. The melting point is 1350 ℃. It has hydrogen storage capacity and can absorb hydrogen at low temperature. This kind of alloy is usually called hydrogen storage alloy. Lanthanum nickel five can be used for storage and transportation of hydrogen, hydrogen vehicle power, fuel cell, hydrogen separation and purification, propylene hydrogenation catalyst, etc.

LaNi5 alloy sputtering target is a kind of binary alloy sputtering target made of high-purity lanthanum powder and nickel powder in a certain proportion. After the lanthanum nickel alloy sputtering target is made into a lanthanum nickel alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

LaNi5 Alloy Sputtering Target Application

LaNi5 alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing LaNi5 alloy films.