Lanthanum Nickel Alloy Sputtering Target (La-Ni)

Lanthanum Nickel Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Lanthanum Nickel Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
Lanthanum Nickel Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
Lanthanum Nickel Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
Lanthanum Nickel Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
Lanthanum Nickel Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
Lanthanum Nickel Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
Lanthanum Nickel Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Lanthanum nickel alloy sputtering target is a kind of binary alloy sputtering target made of high-purity lanthanum powder and nickel powder in a certain proportion. After the lanthanum nickel alloy sputtering target is made into a lanthanum nickel alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, lanthanum nickel alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. lanthanum nickel alloy targets. We can customize lanthanum nickel alloy sputtering targets with different shapes according to customers' requirements, or we can customize targets with different lanthanum nickel alloy compositions according to customers' chemical composition requirements.

Lanthanum Nickel Alloy Sputtering Target Application

Lanthanum nickel alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing lanthanum nickel alloy films.