Magnesium Oxide Sputtering Target

Magnesium Oxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Magnesium Oxide Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
Magnesium Oxide Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
Magnesium Oxide Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
Magnesium Oxide Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
Magnesium Oxide Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
Magnesium Oxide Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
Magnesium Oxide Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

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Magnesium oxide is a white powder in appearance. The chemical formula is MgO, the melting point is 2852 ℃, the boiling point is 3600 ℃, and the relative density is 3.58 (25 ℃). Magnesium oxide is soluble in acid and ammonium salt solution, but insoluble in alcohol. The solubility of MgO in water is 0.00062 g / 100 ml (0 ° C).

Magnesium oxide sputtering target is a kind of magnesium oxide raw material by sputtering deposition. According to the different shapes, magnesium oxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) magnesium oxide targets. Magnesium oxide is mainly used in high-grade lubricating oil, high-grade tanning alkali grade, food grade, medicine, silicon steel grade, high-grade electromagnetic grade, high-purity magnesium oxide and so on.

Magnesium Oxide Sputtering Target Application

High purity magnesium oxide sputtering target can be used in many applications. The details are as follows:
- Non-volatile Memory or Ferroelectric RAM;
- Thin film capacitors;
- For CMOS;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.