Magnesium Silicide Sputtering Target
AvailableMagnesium Silicide Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
Symbol: Mg2SiPurity: 99.5% - 99.9%Size: 0 - 48 inchThickness: ≥ 1 mmShape: Circular, rectangular, annular, rotary etc.Ships to: Worldwide
Magnesium Silicide Sputtering Target List
Product Name |
Shape |
Purity |
Size (inch) |
Thickness (mm) |
Magnesium Silicide Sputtering Target |
Circular |
99.5% - 99.9% |
0 - 48 |
≥ 1 |
Magnesium Silicide Sputtering Target |
Rectangular |
99.5% - 99.9% |
0 - 48 |
≥ 1 |
Magnesium Silicide Sputtering Target |
Annular |
99.5% - 99.9% |
0 - 48 |
≥ 1 |
Magnesium Silicide Sputtering Target |
Oval |
99.5% - 99.9% |
0 - 48 |
≥ 1 |
Magnesium Silicide Sputtering Target |
Cylindrical |
99.5% - 99.9% |
0 - 48 |
≥ 1 |
Magnesium Silicide Sputtering Target |
Planar |
99.5% - 99.9% |
0 - 48 |
≥ 1 |
Magnesium Silicide Sputtering Target |
Rotatable (rotary) |
99.5% - 99.9% |
0 - 48 |
≥ 1 |
Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.
Magnesium silicide is an inorganic compound with cyan or light purple appearance. The chemical formula is Mg2Si and the molecular weight is 76.71. The melting point is 1102 ℃ and the relative density is 1.94. Magnesium silicide is insoluble in cold water and decomposes in hot water. When magnesium silicide is heated to 1200 ℃ in vacuum or hydrogen flow, it can be completely decomposed into elemental matter. It is stable to lye. It decomposes in acid and produces silane and hydrogen.
Magnesium silicide sputtering target is a kind of high purity magnesium silicide raw material by sputtering deposition. According to the different shapes, magnesium silicide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) magnesium silicide targets. Magnesium silicide is a narrow band gap n-type semiconductor material with high melting point, high hardness and high elastic modulus. It is widely used in optoelectronic devices, energy devices, lasers, semiconductor manufacturing, constant temperature control communication and other fields.
Magnesium Silicide Sputtering Target Application
Magnesium silicide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.