Manganese Germanium Alloy Sputtering Target (Mn-Ge)

Manganese Germanium Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Manganese Germanium Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
Manganese Germanium Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
Manganese Germanium Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
Manganese Germanium Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
Manganese Germanium Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
Manganese Germanium Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
Manganese Germanium Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Manganese germanium alloy sputtering target is a kind of binary alloy sputtering target made of high-purity manganese powder and germanium powder in a certain proportion. After the manganese germanium alloy sputtering target is made into a manganese germanium alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, manganese germanium alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. manganese germanium alloy targets. We can customize manganese germanium alloy sputtering targets with different shapes according to customers' requirements, or we can customize targets with different manganese germanium alloy compositions according to customers' chemical composition requirements.

Manganese Germanium Alloy Sputtering Target Application

Manganese germanium alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing manganese germanium alloy films.