Manganese Telluride Sputtering Target

Manganese Telluride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Manganese Telluride Sputtering Target	Circular	99.9% - 99.99%	0 - 48	≥ 1
Manganese Telluride Sputtering Target	Rectangular	99.9% - 99.99%	0 - 48	≥ 1
Manganese Telluride Sputtering Target	Annular	99.9% - 99.99%	0 - 48	≥ 1
Manganese Telluride Sputtering Target	Oval	99.9% - 99.99%	0 - 48	≥ 1
Manganese Telluride Sputtering Target	Cylindrical	99.9% - 99.99%	0 - 48	≥ 1
Manganese Telluride Sputtering Target	Planar	99.9% - 99.99%	0 - 48	≥ 1
Manganese Telluride Sputtering Target	Rotatable (rotary)	99.9% - 99.99%	0 - 48	≥ 1

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Manganese telluride is a chemical compound of manganese and tellurium. The molecular formula is MnTe. The molecular weight is 182.54. The density is 6 g/cm3. The melting point is 1150 °C.

Manganese telluride sputtering target is a kind of high purity manganese telluride raw material by sputtering deposition. According to the different shapes, manganese telluride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) manganese telluride targets. 

Manganese Telluride Sputtering Target Application

Manganese telluride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.