Molybdenum Tantalum Alloy Sputtering Target (Mo-Ta)

Molybdenum Tantalum Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Molybdenum Tantalum Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
Molybdenum Tantalum Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
Molybdenum Tantalum Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
Molybdenum Tantalum Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
Molybdenum Tantalum Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
Molybdenum Tantalum Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
Molybdenum Tantalum Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Molybdenum tantalum alloy sputtering target is a kind of binary alloy sputtering target made of high-purity molybdenum powder and tantalum powder in a certain proportion. After the molybdenum tantalum alloy sputtering target is made into a molybdenum tantalum alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, molybdenum tantalum alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. molybdenum tantalum alloy targets. We can customize molybdenum tantalum alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Molybdenum Tantalum Alloy Sputtering Target Application

Molybdenum tantalum alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing molybdenum tantalum alloy films.