Molybdenum Trioxide Sputtering Target

Molybdenum Trioxide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Molybdenum Trioxide Sputtering Target	Circular	99.9% - 99.99%	0 - 48	≥ 1
Molybdenum Trioxide Sputtering Target	Rectangular	99.9% - 99.99%	0 - 48	≥ 1
Molybdenum Trioxide Sputtering Target	Annular	99.9% - 99.99%	0 - 48	≥ 1
Molybdenum Trioxide Sputtering Target	Oval	99.9% - 99.99%	0 - 48	≥ 1
Molybdenum Trioxide Sputtering Target	Cylindrical	99.9% - 99.99%	0 - 48	≥ 1
Molybdenum Trioxide Sputtering Target	Planar	99.9% - 99.99%	0 - 48	≥ 1
Molybdenum Trioxide Sputtering Target	Rotatable (rotary)	99.9% - 99.99%	0 - 48	≥ 1

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Molybdenum trioxide is a kind of oxide metal powder with white crystal in appearance. The molecular formula is MoO3, the melting point is 795 ℃, the relative density is 4.69, and the boiling point is 1150 ℃. Molybdenum trioxide is slightly soluble in water, concentrated nitric acid and hydrochloric acid, and easily soluble in concentrated alkali.

Molybdenum trioxide sputtering target is a kind of high purity molybdenum oxide raw material by sputtering deposition. According to the different shapes, molybdenum oxide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) molybdenum oxide targets. It can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. 

Molybdenum Trioxide Sputtering Target Application

High purity molybdenum trioxide sputtering target can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The details are as follows:
- Ferroelectric;
- Gate dielectric;
- For CMOS;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.