Nickel Niobium Alloy Sputtering Target (Ni-Nb)

Nickel Niobium Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Nickel Niobium Alloy Sputtering Target	Circular	99.5%	0 - 48	≥ 1
Nickel Niobium Alloy Sputtering Target	Rectangular	99.5%	0 - 48	≥ 1
Nickel Niobium Alloy Sputtering Target	Annular	99.5%	0 - 48	≥ 1
Nickel Niobium Alloy Sputtering Target	Oval	99.5%	0 - 48	≥ 1
Nickel Niobium Alloy Sputtering Target	Cylindrical	99.5%	0 - 48	≥ 1
Nickel Niobium Alloy Sputtering Target	Planar	99.5%	0 - 48	≥ 1
Nickel Niobium Alloy Sputtering Target	Rotatable (rotary)	99.5%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Nickel niobium alloy sputtering target is a kind of binary alloy sputtering target made of high-purity nickel powder and niobium powder in a certain proportion. After the nickel niobium alloy sputtering target is made into a nickel niobium alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, nickel niobium alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. nickel niobium alloy targets. We can customize nickel niobium alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Nickel Niobium Alloy Sputtering Target Application

Nickel niobium alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing nickel niobium alloy films.