Niobium Nitride Sputtering Target

Niobium Nitride Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Niobium Nitride Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Niobium Nitride Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Niobium Nitride Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Niobium Nitride Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Niobium Nitride Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Niobium Nitride Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Niobium Nitride Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Niobium nitride is a kind of nitride with gray in appearance. The chemical formula is NbN. The density is 8.470 g / cm3 and the melting point is 2573 ° C. Niobium nitride can be prepared by sputtering in the mixture of argon and nitrogen. Niobium nitride is an excellent superconducting thin film material with high thermal and chemical stability and neutron irradiation resistance.

Niobium nitride sputtering target is a kind of high purity niobium nitride raw material by sputtering deposition. According to the different shapes, niobium nitride sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) niobium nitride targets. Niobium nitride can be used to fabricate highly stable superconducting quantum devices.

Niobium Nitride Sputtering Target Application

Niobium nitride sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.