Rotatable (Rotary) Aluminum Oxide Sputtering Target

Rotatable Aluminum Oxide Sputtering Target List

Product Name	Purity	Size (inch)	Thickness (mm)
Rotatable Aluminum Oxide Sputtering Target	99.99%	0 - 48	≥ 1

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The rotatable alumina sputtering target refers to the tubular alumina target. It is also called aluminum oxide tube target.

Rotatable Aluminum Oxide Sputtering Target Application

Rotatable aluminum oxide sputtering target can be used in microelectronics, display, storage and other fields. The details are as follows:
- Aerospace;
- Automobile;
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.