Rotatable / Rotarty Nickel Sputtering Target

Rotatable Nickel Sputtering Target List

Product Name	Purity	Size (inch)	Thickness (mm)
Rotatable Nickel Sputtering Target	99.9%	0 - 48	≥ 1
Rotatable Nickel Sputtering Target	99.95%	0 - 48	≥ 1
Rotatable Nickel Sputtering Target	99.99%	0 - 48	≥ 1
Rotatable Nickel Sputtering Target	99.995%	0 - 48	≥ 1
Rotatable Nickel Sputtering Target	99.999%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Rotatable nickel sputtering target refers to nickel target in tubular shape. It is also called nickel tube target.

Rotatable Nickel Sputtering Target Application

Rotatable nickel sputtering target can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Microelectronics industry;
- Optical applications.