Rotatable (Rotary) Tantalum Sputtering Target

Rotatable Tantalum Sputtering Target List

Product Name	Purity	Size (inch)	Thickness (mm)
Rotatable Tantalum Sputtering Target	99.95%	0 - 48	≥ 1
Rotatable Tantalum Sputtering Target	99.99%	0 - 48	≥ 1

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Rotatable tantalum sputtering target refers to a tubular tantalum sputtering target. Sometimes called tantalum tube target.

Rotatable Tantalum Sputtering Target Application

Rotatable tantalum sputtering target is a kind of high purity tantalum raw material for sputtered deposition. It can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.  The details as follows:
- Used in semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.