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Ruthenium Sputtering Target

Ruthenium Sputtering Target

AvailableRuthenium Sputtering Target for SaleWholesale & RetailManufacturer & SupplierFactory Supply
  • Symbol: Ru
  • Purity: 99.95% - 99.99%
  • Size: 0 - 48 inch
  • Thickness: ≥ 1 mm
  • Shape: Circular, rectangular, annular, rotary etc.
  • Ships to: Worldwide
  • Ruthenium Sputtering Target List

    Product Name Shape Purity Size (inch) Thickness (mm)
    Ruthenium Sputtering Target Circular 99.95% - 99.99% 0 - 48 ≥ 1
    Ruthenium Sputtering Target Rectangular 99.95% - 99.99% 0 - 48 ≥ 1
    Ruthenium Sputtering Target Annular 99.95% - 99.99% 0 - 48 ≥ 1
    Ruthenium Sputtering Target Oval 99.95% - 99.99% 0 - 48 ≥ 1
    Ruthenium Sputtering Target Cylindrical 99.95% - 99.99% 0 - 48 ≥ 1
    Ruthenium Sputtering Target Planar 99.95% - 99.99% 0 - 48 ≥ 1
    Ruthenium Sputtering Target Rotatable (rotary) 99.95% - 99.99% 0 - 48 ≥ 1
    Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

    Ruthenium is a kind of hard rare metal with silver white appearance. The element symbol is Ru. The density is 12.30g/cm3. The melting point is 2310 ℃ and the boiling point is 3900 ℃. Ruthenium has stable chemical properties and strong corrosion resistance. It can resist the corrosion of hydrochloric acid, sulfuric acid, nitric acid and aqua regia at room temperature. At 100 ℃, ruthenium is resistant to common acids including aqua regia, hydrofluoric acid and phosphoric acid. At room temperature, the iodine in chlorine water, bromine water and alcohol can slightly corrode ruthenium.

    Ruthenium sputtering target is a kind of high purity ruthenium raw material by sputtering deposition. According to the different shapes, ruthenium sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) ruthenium targets. The use of ruthenium is mainly determined by its physical and chemical properties. It is mainly used as catalyst, Ru based resistance slurry, ultra-fine hydrated RuO2 powder, Ru based thick film resistance slurry, electric contact alloy and hard ground cemented carbide.

    Ruthenium Sputtering Target Application

    Ruthenium sputtering target can be used in many applications. The details are as follows:
    - Electronics;
    - Semiconductor;
    - Flat panel displays.
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