Tantalum Carbide Sputtering Target

Tantalum Carbide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tantalum Carbide Sputtering Target	Circular	99.5% - 99.9%	0 - 48	≥ 1
Tantalum Carbide Sputtering Target	Rectangular	99.5% - 99.9%	0 - 48	≥ 1
Tantalum Carbide Sputtering Target	Annular	99.5% - 99.9%	0 - 48	≥ 1
Tantalum Carbide Sputtering Target	Oval	99.5% - 99.9%	0 - 48	≥ 1
Tantalum Carbide Sputtering Target	Cylindrical	99.5% - 99.9%	0 - 48	≥ 1
Tantalum Carbide Sputtering Target	Planar	99.5% - 99.9%	0 - 48	≥ 1
Tantalum Carbide Sputtering Target	Rotatable (rotary)	99.5% - 99.9%	0 - 48	≥ 1

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Tantalum carbide is a kind of light brown carbide in appearance. The chemical formula is TaC. The density is 14.65 g/cm3. Tantalum carbide is insoluble in water, insoluble in inorganic acid, soluble in the mixed acid of hydrofluoric acid and nitric acid and can be decomposed. Tantalum carbide has strong oxidation resistance and is easy to be melted and decomposed by potassium pyrosulfate. And it has good conductivity.

Tantalum carbide sputtering target is a kind of high purity tantalum carbide raw material by sputtering deposition. According to the different shapes, tantalum carbide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) tantalum carbide targets. Tantalum carbide can be used in powder metallurgy, cutting tools, fine ceramics, chemical vapor deposition, hard wear-resistant alloy tools, tools, molds and additives for wear-resistant and corrosion-resistant structural parts.

Tantalum Carbide Sputtering Target Application

Tantalum carbide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.