Tantalum Disilicide Sputtering Target

Tantalum Disilicide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tantalum Disilicide Sputtering Target	Circular	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Disilicide Sputtering Target	Rectangular	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Disilicide Sputtering Target	Annular	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Disilicide Sputtering Target	Oval	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Disilicide Sputtering Target	Cylindrical	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Disilicide Sputtering Target	Planar	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Disilicide Sputtering Target	Rotatable (rotary)	99.95% - 99.99%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Tantalum disilicide is a kind of silicide with gray appearance. The chemical formula is TaSi2. The density is 9.14 g/cm3. The melting point is 2200℃.

Tantalum disilicide sputtering target is a kind of high purity tantalum disilicide raw material by sputtering deposition. According to the different shapes, tantalum disilicide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) tantalum disilicide targets. 

Tantalum Disilicide Sputtering Target Application

Tantalum disilicide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.