Tantalum Sputtering Target

Tantalum Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tantalum Sputtering Target	Circular	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Sputtering Target	Rectangular	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Sputtering Target	Annular	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Sputtering Target	Oval	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Sputtering Target	Cylindrical	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Sputtering Target	Planar	99.95% - 99.99%	0 - 48	≥ 1
Tantalum Sputtering Target	Rotatable (rotary)	99.95% - 99.99%	0 - 48	≥ 1

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Tantalum is a kind of steel gray metal, its chemical symbol is ta. In the periodic table of elements, it belongs to VB group with atomic number of 73 and atomic weight of 180.9479. Tantalum belongs to body centered cubic crystal, and its common valence is + 5. The hardness of tantalum is low and related to oxygen content. The Vickers hardness of ordinary pure tantalum is only 140hv. Its melting point is as high as 2995 ℃. The thermal expansion coefficient of tantalum is very small and its toughness is very strong.

Tantalum sputtering target is a kind of high purity tantalum raw material for sputtered deposition. According to the different shapes, tantalum sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) tantalum targets. It can be used as a solid electrolytic capacitor with large capacity, small volume and stable performance, which can be used in radar, missile, supersonic aircraft and computer. In addition, tantalum can also be used to manufacture petrochemical heat exchanger, heater, concentrator and reactor tank, tower, pipeline and valve. Tantalum can also be used as electron emission tube, high power electron tube parts material, surgical repair material and artificial bone.

Tantalum Sputtering Target Application

Tantalum sputtering target is a kind of high purity tantalum raw material for sputtered deposition. The high purity tantalum sputtering target produced by us can obtain thin films with excellent conductivity and particle minimization in the process of physical vapor deposition.It can be used in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.  The details as follows:
- Used in semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.