Terbium Cobalt Alloy Sputtering Target (Tb-Co)

Terbium Cobalt Alloy Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Terbium Cobalt Alloy Sputtering Target	Circular	99.9%	0 - 48	≥ 1
Terbium Cobalt Alloy Sputtering Target	Rectangular	99.9%	0 - 48	≥ 1
Terbium Cobalt Alloy Sputtering Target	Annular	99.9%	0 - 48	≥ 1
Terbium Cobalt Alloy Sputtering Target	Oval	99.9%	0 - 48	≥ 1
Terbium Cobalt Alloy Sputtering Target	Cylindrical	99.9%	0 - 48	≥ 1
Terbium Cobalt Alloy Sputtering Target	Planar	99.9%	0 - 48	≥ 1
Terbium Cobalt Alloy Sputtering Target	Rotatable (rotary)	99.9%	0 - 48	≥ 1

Note: We provide customized service. If you don't find the sputtering targets you want, please send us an email directly. We can customize it according to your requirements.

Terbium cobalt alloy sputtering target is a kind of binary alloy sputtering target made of high-purity terbium powder and cobalt powder in a certain proportion. After the terbium cobalt alloy sputtering target is made into a terbium cobalt alloy blank through a special production process, it is machined according to the size and shape required by customers, and finally the finished product is presented through vacuum packaging.

According to different shapes, terbium cobalt alloy sputtering targets can be divided into circular, planar, cylindrical, disc, etc. terbium cobalt alloy targets. We can customize terbium cobalt alloy sputtering targets with different shapes and chemical composition according to customers' requirements.

Terbium Cobalt Alloy Sputtering Target Application

Terbium cobalt alloy sputtering target can be used in many applications. The details are as follows:
- Chemical vapor deposition (CVD);
- Physical vapor deposition (PVD);
- Used for preparing terbium cobalt alloy films.