Tin Selenide Sputtering Target

Tin Selenide Sputtering Target List

Product Name	Shape	Purity	Size (inch)	Thickness (mm)
Tin Selenide Sputtering Target	Circular	99.99% - 99.999%	0 - 48	≥ 1
Tin Selenide Sputtering Target	Rectangular	99.99% - 99.999%	0 - 48	≥ 1
Tin Selenide Sputtering Target	Annular	99.99% - 99.999%	0 - 48	≥ 1
Tin Selenide Sputtering Target	Oval	99.99% - 99.999%	0 - 48	≥ 1
Tin Selenide Sputtering Target	Cylindrical	99.99% - 99.999%	0 - 48	≥ 1
Tin Selenide Sputtering Target	Planar	99.99% - 99.999%	0 - 48	≥ 1
Tin Selenide Sputtering Target	Rotatable (rotary)	99.99% - 99.999%	0 - 48	≥ 1

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Tin selenide is a kind of selenide with gray orthorhombic crystal. The chemical formula is SnSe. The density is 6.18 g/m3. The melting point is 861 ℃. Tin selenide is insoluble in water, but soluble in nitric acid and aqua regia. Tin selenide is prepared by the direct reaction of selenium and tin or the reaction of tin salt and hydrogen selenide.

Tin selenide sputtering target is a kind of high purity tin selenide raw material by sputtering deposition. According to the different shapes, tin selenide sputtering targets can be divided into circular, rectangular, square, annular, oval, cylindrical, planar, rotatable (rotary) tin selenide targets. Tin selenide can be used as semiconductor material.

Tin Selenide Sputtering Target Application

High purity tin selenide sputtering target can be used in many applications. The details are as follows:
- Semiconductor;
- Chemical vapor deposition (CVD) display;
- Physical vapor deposition (PVD) display;
- Optical applications.